Fills an enclosed area or selected objects with a hatch pattern or gradient fill.
Filling the specified area with different material so as to distinguish project parts. These patterns are both predefined and user defined.
Entity bhatch includes three kinds of Bhatch using patterns, Solid, PLINE or DONUT.
Gradient hatch refers to a kind of hatch pattern among different gradations within one or two colors. Which can be used to increase the drawing demonstration effects or use as background.
To create a hatch, you should specify hatch area first which is so-called hatch boundary, various methods of creating hatch boundaries are provided as well as creating associative hatch for controlling the hatch pattern updated along with the boundary changes. If the specified boundary is not a closed area, you can set maximum gap which is controlled by system variable HPGAPTOL when using the object as pattern boundary, any gap within this value range will be taken as closed boundary. But this gap is only available for lines and arcs, they'll be joined if extended. When creating hatch patterns, you can specify the draw order of the patterns to decide hatching before or after the boundaries, or set it in front or at back of all objects.
Add Hatch Patterns and Solid Fills
You can use BHATCH command to add hatch pattern to the drawing. When defining hatch patterns, you can specify the options in hatch dialog box: scale, angle, space, ISO pen width, associativity and double hatch.
Create Associative Hatches
If you select associative hatch properties when hatching the area, the hatched pattern updates automatically with the boundaries. By default, the hatch pattern created by BHATCH is associative. The associativity of a hatch pattern can be removed whenever you want.
The objects that are outside the specified boundary will be ignored when creating hatches.
If the text, properties or solid entities are connected to hatch patterns, only hatches the boundaries of these objects with the center retained as blank in order to form islands.
Choose a Hatch Pattern
User can select hatch patterns to distinguish different parts of the object and represent the object materials during hatching process. 14 ISO hatch patterns are provided, ISO pen width can be specified while selecting ISO hatch patterns. Pen width option is set to determine the pen width of the pattern.
In Hatch dialog box, the Pattern area contains all the pattern names defined in icad.pat file. You can define new hatch patterns in icad.pat, and apply them by restarting ZWCAD platform.
Assign a Draw Order to a Hatch
The draw order of hatching and boundaries can be controlled so as to view and select more easily. When creating hatch patterns, you can specify the draw order of the patterns to decide hatching before or after the boundaries, or set it in front or at back of all objects. The value will be stored in system variable HPDRAWORDER.
Other settings of hatch pattern may not be influenced regardless of changing the draw order of hatch pattern.
Limit Hatch Pattern Density
System generates large amounts of dashes and dots to form hatch patterns. Although all these dashes and dots are stored as smaller hatch patterns, the more disk space it occupies and longer generating time it spent than storing normal objects.
You can limit the entity number created by HATCH or BHATCH to avoid this problem. If the required amount of objects for specified hatch patterns over the preset boundaries, system displays prompts automatically, querying on refusing the hatch for too small hatch scale factor or too short dash length. In case of refusing hatches, you should check hatch settings and adjust scale factor or the dash length.
The hatch entity density limit is set in MaxHatch in registry with default value of 10000. It can be modified by setting MaxHatch system registry variable using setenv "MaxHatch" "n", in which n is a number between 100 and 10000000.
Edit Hatch Boundaries
Hatch boundaries is capable of copy, move and stretch as well as other objects, but for large amount of object combinations, the geometric drawings for editing hatches may cause unpredictable results. It's suggest to abort hatch if necessary and remove the hatched blocks to generate new ones.
Create Custom Hatch Patterns
You can define angle, space of current hatch by selecting User Define type from the Style option Type and pattern in Hatch dialog box, so as to create customized pattern to hatch selected objects.
BHATCH: Fills an enclosed area or selected objects with a hatch pattern or gradient fill
BOUNDARY: Creates a region or a polyline from an enclosed area
DONUT: Draws filled circles and rings
FILL: Controls the filling of objects such as hatches, two-dimensional solids, and wide polylines
HATCH: Fills an closed area or selected object with hatch pattern or gradient hatch pattern.
HATCHEDIT: Modifies an existing hatch object
PLINE: Creates two-dimensional polylines
PROPERTIES: Controls properties of existing objects
SOLID: Creates solid-filled triangles and quadrilaterals
System Variables Reference
FILLMODE: Specifies whether hatches (including solid-fill), two-dimensional solids, wide polylines, are filled in
HPANG: Specifies the hatch pattern angle
HPASSOC: Controls whether hatch patterns and gradient fills are associative
HPBOUND: Controls the object type created by the BHATCH and BOUNDARY commands
HPDRAWORDER: Controls the draw order of hatches and fills
HPDOUBLE: Specifies hatch pattern doubling for user-defined patterns
HPNAME: Sets a default hatch pattern name of up to 34 characters without spaces
HPSCALE: Specifies the hatch pattern scale factor, which must be nonzero
HPSPACE: Specifies the hatch pattern line spacing for user-defined simple patterns, which must be nonzero
PICKSTYLE: Controls the use of group selection and associative hatch selection